A new dimension of resistance measurements.

Tensormeter is designed for automated precision measurements of resistance and voltages. 

In particular, Tensormeter allows for obtaining all components of the resistivity tensor simultaneously. 

Tensormeter unites the benefits of both Lock-in Amplifiers and Source/Measure Units through an innovative flexible architecture.

Your Benefits.

Simpler measurements. 

Better results.

Measure Sheet & Hall resistance at high precision and extremly low noise

Measure irregularly shaped samples without need for lithographic patterning

Replace Lock-in Amplifier, Source Measure Unit, Digital Multimeter, Analog Matrix Switch

Save measuring time, achieve higher throughput

The new standard in resistance measurements.

Tensormeter replaces all standard devices for electrical characterization measurements such as Lock-in Amplifiers, Source/Measure Units, Digital Multimeters or Analog Matrix Switches.

Tensormeter can be used for a variety of measuring applications within thin film characterization, wafer and device testing as well as materials research. 

Tensormeter solves the limitations of 4-wire-measurements by measuring the resistivity tensor, which makes measurements resilient against measurement geometry changes and provides greater precision.

With only one device and one automated measurement a full set of electrical parameters can be derived for a comprehensive electrical sample characterization. 

The evolution of the van-der-Pauw concept.

Tensormeter enables a comprehensive electrical characterization of thin film and bulk samples on the basis of a 4-point geometry, such as the simultaneous measurement of sheet resistance and Hall resistance, van-der-Pauw measurements on unstructured thin film samples or zero-offset Hall effect measurements. 

Owing to its unique design the Tensormeter provides exactly separated and absolute values for the longitudinal and transverse resistances of a sample simultaneously, even for irregular shapes that are not litographically patterned.  

When using the Tensormeter, photolithography can thus be foregone in many characterization tasks, saving massive time and investment. 

Despite using only half the number of switching configurations compared to the conventional van-der-Pauw & Hall measurements, the full precision of the measusured signal is restored by post calculation within the device, potentially doubling throughput.

Tensormeter provides extremely low noise measurements allowing for short integration times and, thus, creates massive measuring time savings. 

A single device

for a variety of applications.